What is Reactive Ion Etching (RIE)? Reactive Ion Etching (RIE) is a dry etching technique widely used in the fabrication of micro- and nanodevices. It combines the chemical reactivity of reactive ...
Our team at LASER COMPONENTS Canada used inductively coupled plasma-reactive ion etching (ICP-RIE) to achieve precise waveguide trench geometries with sidewall angles of 60 ° to 70 ...
The etching and characterization room contains a suite of tools for dry etching and characterization of samples. This includes three dry etchers with a range of capabilities, while characterization ...
It's worth noting that wet etching differs from dry etching techniques, such as reactive ion etching (RIE), which use plasma to remove material from a substrate. While both techniques are used in ...
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Let us help you with your inquiries, brochures and pricing requirements Request A Quote Download PDF Copy Download Brochure The PlasmaPro 100 Cobra ICP RIE system ...
Oxford Instruments Plasma Technology PlasmaPro 100 Cobra 300 ICP RIE ALE The Oxford Instruments Cobra is perhaps the highest performance R&D etch system in the academic world. Our system is configured ...
Company Information: Universal Semiconductor Inc is one of the early pioneering semiconductor companies in the world that extended and developed innovative technologies for diverse applications. They ...
At least that’s [Sam]’s plan, which his new reactive-ion etching setup aims to make possible. While his Z1 dual differential amplifier chip was a huge success, the photolithography process he ...