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最小线宽: 5nm
用途:利用电子束在抗蚀剂上书写纳米级图案,通过ELB设备曝光和显影,可用于加工sub-10nm的精细结构。 一、简介 ELS-F125是Elionix推出的世界上最早的加速电压高达125KV的电子束曝光系统之一,其可加工线宽下限为5nm的精细图形。(以下参数基于ELS-F125) 电子束曝光 ...
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